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Metrology for nanostructures
Application of monowavelength Mueller Polarimetry to the measurement of sub-micron particles
- Granulometry: Measurement of the density and size distribution of diluted and very concentrated sub-micron particles (0.4 - 1 m) solutions, along with Monte Carlo simulations for the understanding of the measurements.
- Characterization of particles on silicon surfaces with
sizes from 200nm. This technique could be applied for the control of the surface cleanliness in the semiconductor industry.
Polarimetry applied to the microelectronics circuitry
- Scatterometry: (UV-visible) Spectroscopic Ellipsometry measurements done at the zero order. The measurements are analyzed by our RCWA code, which stands for Rigorous Couple Wave Analysis.
On the right there's a scheme of a 3D matrix from LETI measured and simulated by resolved angle polarimetry. Our RCWA modelization has shown to be very well suited for the analysis of the measurements.
Contact : Tatiana Novikova - Antonello De Martino